Metrology solutions using optical scatterometry for advanced CMOS: III-V and Germanium multi-gate field-effect transistors

Metrology solutions using optical scatterometry for advanced CMOS: III-V and Germanium multi-gate field-effect transistors

10.1117/12.2020248

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Bibliographic Details
Main Authors: Chin, H.-C., Liu, B., Zhang, X., Ling, M.-L., Yip, C.-H., Liu, Y., Hu, J., Yeo, Y.-C.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Subjects:
Ellipsometry
FinFET
Germanium
III-V
OCD
Optical critical dimension
Scatterometry
Online Access:http://scholarbank.nus.edu.sg/handle/10635/70923
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-709232023-10-29T22:00:37Z Metrology solutions using optical scatterometry for advanced CMOS: III-V and Germanium multi-gate field-effect transistors Chin, H.-C. Liu, B. Zhang, X. Ling, M.-L. Yip, C.-H. Liu, Y. Hu, J. Yeo, Y.-C. ELECTRICAL & COMPUTER ENGINEERING Ellipsometry FinFET Germanium III-V OCD Optical critical dimension Scatterometry 10.1117/12.2020248 Proceedings of SPIE - The International Society for Optical Engineering 8788 - PSISD 2014-06-19T03:17:49Z 2014-06-19T03:17:49Z 2013 Conference Paper Chin, H.-C., Liu, B., Zhang, X., Ling, M.-L., Yip, C.-H., Liu, Y., Hu, J., Yeo, Y.-C. (2013). Metrology solutions using optical scatterometry for advanced CMOS: III-V and Germanium multi-gate field-effect transistors. Proceedings of SPIE - The International Society for Optical Engineering 8788 : -. ScholarBank@NUS Repository. https://doi.org/10.1117/12.2020248 9780819496041 0277786X http://scholarbank.nus.edu.sg/handle/10635/70923 000323493700058 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
topic Ellipsometry
FinFET
Germanium
III-V
OCD
Optical critical dimension
Scatterometry
spellingShingle Ellipsometry
FinFET
Germanium
III-V
OCD
Optical critical dimension
Scatterometry
Chin, H.-C.
Liu, B.
Zhang, X.
Ling, M.-L.
Yip, C.-H.
Liu, Y.
Hu, J.
Yeo, Y.-C.
Metrology solutions using optical scatterometry for advanced CMOS: III-V and Germanium multi-gate field-effect transistors
description 10.1117/12.2020248
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Chin, H.-C.
Liu, B.
Zhang, X.
Ling, M.-L.
Yip, C.-H.
Liu, Y.
Hu, J.
Yeo, Y.-C.
format Conference or Workshop Item
author Chin, H.-C.
Liu, B.
Zhang, X.
Ling, M.-L.
Yip, C.-H.
Liu, Y.
Hu, J.
Yeo, Y.-C.
author_sort Chin, H.-C.
title Metrology solutions using optical scatterometry for advanced CMOS: III-V and Germanium multi-gate field-effect transistors
title_short Metrology solutions using optical scatterometry for advanced CMOS: III-V and Germanium multi-gate field-effect transistors
title_full Metrology solutions using optical scatterometry for advanced CMOS: III-V and Germanium multi-gate field-effect transistors
title_fullStr Metrology solutions using optical scatterometry for advanced CMOS: III-V and Germanium multi-gate field-effect transistors
title_full_unstemmed Metrology solutions using optical scatterometry for advanced CMOS: III-V and Germanium multi-gate field-effect transistors
title_sort metrology solutions using optical scatterometry for advanced cmos: iii-v and germanium multi-gate field-effect transistors
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/70923
_version_ 1781783187300548608

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