Path to achieve sub-10-nm half-pitch using electron beam lithography

Path to achieve sub-10-nm half-pitch using electron beam lithography

10.1116/1.3532938

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Bibliographic Details
Main Authors: Tavakkoli, A.K.G., Piramanayagam, S.N., Ranjbar, M., Sbiaa, R., Chong, T.C.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/71379
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Institution: National University of Singapore
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Summary:10.1116/1.3532938

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