Path to achieve sub-10-nm half-pitch using electron beam lithography

10.1116/1.3532938

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Bibliographic Details
Main Authors:	Tavakkoli, A.K.G., Piramanayagam, S.N., Ranjbar, M., Sbiaa, R., Chong, T.C.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/71379
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-71379
record_format	dspace
spelling	sg-nus-scholar.10635-713792023-10-26T07:58:54Z Path to achieve sub-10-nm half-pitch using electron beam lithography Tavakkoli, A.K.G. Piramanayagam, S.N. Ranjbar, M. Sbiaa, R. Chong, T.C. ELECTRICAL & COMPUTER ENGINEERING 10.1116/1.3532938 Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 29 1 0110351-0110357 JVTBD 2014-06-19T03:23:05Z 2014-06-19T03:23:05Z 2011-01 Conference Paper Tavakkoli, A.K.G., Piramanayagam, S.N., Ranjbar, M., Sbiaa, R., Chong, T.C. (2011-01). Path to achieve sub-10-nm half-pitch using electron beam lithography. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 29 (1) : 0110351-0110357. ScholarBank@NUS Repository. https://doi.org/10.1116/1.3532938 10711023 http://scholarbank.nus.edu.sg/handle/10635/71379 000286679400038 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1116/1.3532938
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Tavakkoli, A.K.G. Piramanayagam, S.N. Ranjbar, M. Sbiaa, R. Chong, T.C.
format	Conference or Workshop Item
author	Tavakkoli, A.K.G. Piramanayagam, S.N. Ranjbar, M. Sbiaa, R. Chong, T.C.
spellingShingle	Tavakkoli, A.K.G. Piramanayagam, S.N. Ranjbar, M. Sbiaa, R. Chong, T.C. Path to achieve sub-10-nm half-pitch using electron beam lithography
author_sort	Tavakkoli, A.K.G.
title	Path to achieve sub-10-nm half-pitch using electron beam lithography
title_short	Path to achieve sub-10-nm half-pitch using electron beam lithography
title_full	Path to achieve sub-10-nm half-pitch using electron beam lithography
title_fullStr	Path to achieve sub-10-nm half-pitch using electron beam lithography
title_full_unstemmed	Path to achieve sub-10-nm half-pitch using electron beam lithography
title_sort	path to achieve sub-10-nm half-pitch using electron beam lithography
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/71379
_version_	1781783204435329024

Path to achieve sub-10-nm half-pitch using electron beam lithography

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