Pulsed laser annealing of ultra-shallow junctions in silicon-germanium

• Main Authors: Tan, L.S., Tan, J.Y., Begum, A., Hong, M.H., Du, A.Y., Bhat, M., Wang, X.C.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Conference or Workshop Item
• Published: 2014
• Subjects: end-of-range defects; Pulsed laser annealing; ultra-shallow junction
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/71526
• Institution: National University of Singapore

10.1142/S0219581X10006922