Real-time estimation and control of CD uniformity in lithography

10.1109/ASMC.2008.4529026

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Bibliographic Details
Main Author: Tay, A.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/71563
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Institution: National University of Singapore
id sg-nus-scholar.10635-71563
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spelling sg-nus-scholar.10635-715632023-10-30T09:31:27Z Real-time estimation and control of CD uniformity in lithography Tay, A. ELECTRICAL & COMPUTER ENGINEERING 10.1109/ASMC.2008.4529026 ASMC (Advanced Semiconductor Manufacturing Conference) Proceedings 185-190 2014-06-19T03:25:08Z 2014-06-19T03:25:08Z 2008 Conference Paper Tay, A. (2008). Real-time estimation and control of CD uniformity in lithography. ASMC (Advanced Semiconductor Manufacturing Conference) Proceedings : 185-190. ScholarBank@NUS Repository. https://doi.org/10.1109/ASMC.2008.4529026 9781424419 10788743 http://scholarbank.nus.edu.sg/handle/10635/71563 000258474300039 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1109/ASMC.2008.4529026
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Tay, A.
format Conference or Workshop Item
author Tay, A.
spellingShingle Tay, A.
Real-time estimation and control of CD uniformity in lithography
author_sort Tay, A.
title Real-time estimation and control of CD uniformity in lithography
title_short Real-time estimation and control of CD uniformity in lithography
title_full Real-time estimation and control of CD uniformity in lithography
title_fullStr Real-time estimation and control of CD uniformity in lithography
title_full_unstemmed Real-time estimation and control of CD uniformity in lithography
title_sort real-time estimation and control of cd uniformity in lithography
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/71563
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