Real-time estimation and control of CD uniformity in lithography
10.1109/ASMC.2008.4529026
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sg-nus-scholar.10635-715632023-10-30T09:31:27Z Real-time estimation and control of CD uniformity in lithography Tay, A. ELECTRICAL & COMPUTER ENGINEERING 10.1109/ASMC.2008.4529026 ASMC (Advanced Semiconductor Manufacturing Conference) Proceedings 185-190 2014-06-19T03:25:08Z 2014-06-19T03:25:08Z 2008 Conference Paper Tay, A. (2008). Real-time estimation and control of CD uniformity in lithography. ASMC (Advanced Semiconductor Manufacturing Conference) Proceedings : 185-190. ScholarBank@NUS Repository. https://doi.org/10.1109/ASMC.2008.4529026 9781424419 10788743 http://scholarbank.nus.edu.sg/handle/10635/71563 000258474300039 Scopus |
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10.1109/ASMC.2008.4529026 |
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ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING Tay, A. |
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Conference or Workshop Item |
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Tay, A. |
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Tay, A. Real-time estimation and control of CD uniformity in lithography |
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Tay, A. |
title |
Real-time estimation and control of CD uniformity in lithography |
title_short |
Real-time estimation and control of CD uniformity in lithography |
title_full |
Real-time estimation and control of CD uniformity in lithography |
title_fullStr |
Real-time estimation and control of CD uniformity in lithography |
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Real-time estimation and control of CD uniformity in lithography |
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real-time estimation and control of cd uniformity in lithography |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/71563 |
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