Real-time estimation and control of CD uniformity in lithography
10.1109/ASMC.2008.4529026
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Main Author: | Tay, A. |
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Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Conference or Workshop Item |
Published: |
2014
|
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/71563 |
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Institution: | National University of Singapore |
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