Real-time spatial control of steady-state wafer temperature during thermal processing in microlithography

Real-time spatial control of steady-state wafer temperature during thermal processing in microlithography

10.1117/12.654741

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Bibliographic Details
Main Authors: Tay, A., Ho, W.-K., Hu, N., Tsai, K.-Y., Zhou, Y.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Subjects:
Microlithography
Photoresist Processing
Semiconductor Manufacturing
Temperature Control
Online Access:http://scholarbank.nus.edu.sg/handle/10635/71572
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Institution: National University of Singapore
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Summary:10.1117/12.654741

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