Real-time spatial control of steady-state wafer temperature during thermal processing in microlithography

10.1117/12.654741

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Bibliographic Details
Main Authors:	Tay, A., Ho, W.-K., Hu, N., Tsai, K.-Y., Zhou, Y.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Subjects:	Microlithography Photoresist Processing Semiconductor Manufacturing Temperature Control
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/71572
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-71572
record_format	dspace
spelling	sg-nus-scholar.10635-715722023-10-25T20:09:00Z Real-time spatial control of steady-state wafer temperature during thermal processing in microlithography Tay, A. Ho, W.-K. Hu, N. Tsai, K.-Y. Zhou, Y. ELECTRICAL & COMPUTER ENGINEERING Microlithography Photoresist Processing Semiconductor Manufacturing Temperature Control 10.1117/12.654741 Proceedings of SPIE - The International Society for Optical Engineering 6155 - PSISD 2014-06-19T03:25:14Z 2014-06-19T03:25:14Z 2006 Conference Paper Tay, A., Ho, W.-K., Hu, N., Tsai, K.-Y., Zhou, Y. (2006). Real-time spatial control of steady-state wafer temperature during thermal processing in microlithography. Proceedings of SPIE - The International Society for Optical Engineering 6155 : -. ScholarBank@NUS Repository. https://doi.org/10.1117/12.654741 0819461989 0277786X http://scholarbank.nus.edu.sg/handle/10635/71572 000238440500009 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	Microlithography Photoresist Processing Semiconductor Manufacturing Temperature Control
spellingShingle	Microlithography Photoresist Processing Semiconductor Manufacturing Temperature Control Tay, A. Ho, W.-K. Hu, N. Tsai, K.-Y. Zhou, Y. Real-time spatial control of steady-state wafer temperature during thermal processing in microlithography
description	10.1117/12.654741
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Tay, A. Ho, W.-K. Hu, N. Tsai, K.-Y. Zhou, Y.
format	Conference or Workshop Item
author	Tay, A. Ho, W.-K. Hu, N. Tsai, K.-Y. Zhou, Y.
author_sort	Tay, A.
title	Real-time spatial control of steady-state wafer temperature during thermal processing in microlithography
title_short	Real-time spatial control of steady-state wafer temperature during thermal processing in microlithography
title_full	Real-time spatial control of steady-state wafer temperature during thermal processing in microlithography
title_fullStr	Real-time spatial control of steady-state wafer temperature during thermal processing in microlithography
title_full_unstemmed	Real-time spatial control of steady-state wafer temperature during thermal processing in microlithography
title_sort	real-time spatial control of steady-state wafer temperature during thermal processing in microlithography
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/71572
_version_	1781783211879170048

Real-time spatial control of steady-state wafer temperature during thermal processing in microlithography

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