New low-voltage contrast mechanism to image local defects in very thin silicon dioxide films. True oxide electron beam induced current

Annual Proceedings - Reliability Physics (Symposium)

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Bibliographic Details
Main Authors:	Lau, W.S., Chan, D.S.H., Phang, J.C.H., Chow, K.W., Pey, K.S., Lim, Y.P., Cronquist, B.
Other Authors:	ELECTRICAL ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/72788
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Institution:	National University of Singapore

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spelling	sg-nus-scholar.10635-727882015-01-20T06:36:25Z New low-voltage contrast mechanism to image local defects in very thin silicon dioxide films. True oxide electron beam induced current Lau, W.S. Chan, D.S.H. Phang, J.C.H. Chow, K.W. Pey, K.S. Lim, Y.P. Cronquist, B. ELECTRICAL ENGINEERING Annual Proceedings - Reliability Physics (Symposium) 190-198 ARLPB 2014-06-19T05:11:59Z 2014-06-19T05:11:59Z 1993 Conference Paper Lau, W.S.,Chan, D.S.H.,Phang, J.C.H.,Chow, K.W.,Pey, K.S.,Lim, Y.P.,Cronquist, B. (1993). New low-voltage contrast mechanism to image local defects in very thin silicon dioxide films. True oxide electron beam induced current. Annual Proceedings - Reliability Physics (Symposium) : 190-198. ScholarBank@NUS Repository. 0780307828 00999512 http://scholarbank.nus.edu.sg/handle/10635/72788 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
description	Annual Proceedings - Reliability Physics (Symposium)
author2	ELECTRICAL ENGINEERING
author_facet	ELECTRICAL ENGINEERING Lau, W.S. Chan, D.S.H. Phang, J.C.H. Chow, K.W. Pey, K.S. Lim, Y.P. Cronquist, B.
format	Conference or Workshop Item
author	Lau, W.S. Chan, D.S.H. Phang, J.C.H. Chow, K.W. Pey, K.S. Lim, Y.P. Cronquist, B.
spellingShingle	Lau, W.S. Chan, D.S.H. Phang, J.C.H. Chow, K.W. Pey, K.S. Lim, Y.P. Cronquist, B. New low-voltage contrast mechanism to image local defects in very thin silicon dioxide films. True oxide electron beam induced current
author_sort	Lau, W.S.
title	New low-voltage contrast mechanism to image local defects in very thin silicon dioxide films. True oxide electron beam induced current
title_short	New low-voltage contrast mechanism to image local defects in very thin silicon dioxide films. True oxide electron beam induced current
title_full	New low-voltage contrast mechanism to image local defects in very thin silicon dioxide films. True oxide electron beam induced current
title_fullStr	New low-voltage contrast mechanism to image local defects in very thin silicon dioxide films. True oxide electron beam induced current
title_full_unstemmed	New low-voltage contrast mechanism to image local defects in very thin silicon dioxide films. True oxide electron beam induced current
title_sort	new low-voltage contrast mechanism to image local defects in very thin silicon dioxide films. true oxide electron beam induced current
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/72788
_version_	1681087629468106752

New low-voltage contrast mechanism to image local defects in very thin silicon dioxide films. True oxide electron beam induced current

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