Real-time control of photoresist thickness uniformity during the bake process
10.1117/12.410103
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sg-nus-scholar.10635-728822015-01-26T15:23:58Z Real-time control of photoresist thickness uniformity during the bake process Lay, Lee Lay Schaper, Charles Khuen, Ho Weng ELECTRICAL ENGINEERING 10.1117/12.410103 Proceedings of SPIE - The International Society for Optical Engineering 4182 54-64 PSISD 2014-06-19T05:13:03Z 2014-06-19T05:13:03Z 2000 Conference Paper Lay, Lee Lay,Schaper, Charles,Khuen, Ho Weng (2000). Real-time control of photoresist thickness uniformity during the bake process. Proceedings of SPIE - The International Society for Optical Engineering 4182 : 54-64. ScholarBank@NUS Repository. <a href="https://doi.org/10.1117/12.410103" target="_blank">https://doi.org/10.1117/12.410103</a> 0277786X http://scholarbank.nus.edu.sg/handle/10635/72882 NOT_IN_WOS Scopus |
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10.1117/12.410103 |
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ELECTRICAL ENGINEERING |
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ELECTRICAL ENGINEERING Lay, Lee Lay Schaper, Charles Khuen, Ho Weng |
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Conference or Workshop Item |
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Lay, Lee Lay Schaper, Charles Khuen, Ho Weng |
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Lay, Lee Lay Schaper, Charles Khuen, Ho Weng Real-time control of photoresist thickness uniformity during the bake process |
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Lay, Lee Lay |
title |
Real-time control of photoresist thickness uniformity during the bake process |
title_short |
Real-time control of photoresist thickness uniformity during the bake process |
title_full |
Real-time control of photoresist thickness uniformity during the bake process |
title_fullStr |
Real-time control of photoresist thickness uniformity during the bake process |
title_full_unstemmed |
Real-time control of photoresist thickness uniformity during the bake process |
title_sort |
real-time control of photoresist thickness uniformity during the bake process |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/72882 |
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