Real-time control of photoresist thickness uniformity during the bake process
10.1117/12.410103
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Main Authors: | Lay, Lee Lay, Schaper, Charles, Khuen, Ho Weng |
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Other Authors: | ELECTRICAL ENGINEERING |
Format: | Conference or Workshop Item |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/72882 |
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Institution: | National University of Singapore |
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