The study of Chromeless Phase Lithography (CPL) for 45nm lithography

10.1117/12.685887

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Bibliographic Details
Main Authors: Soon, Y.T., Qunying, L., Cho, J.T., Chenggen, Q.
Other Authors: MECHANICAL ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Subjects:
CD
CPL
Online Access:http://scholarbank.nus.edu.sg/handle/10635/73949
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-739492023-10-27T07:42:12Z The study of Chromeless Phase Lithography (CPL) for 45nm lithography Soon, Y.T. Qunying, L. Cho, J.T. Chenggen, Q. MECHANICAL ENGINEERING CD Chromeless CPL MEEF Phase 10.1117/12.685887 Proceedings of SPIE - The International Society for Optical Engineering 6349 I - PSISD 2014-06-19T05:41:18Z 2014-06-19T05:41:18Z 2006 Conference Paper Soon, Y.T., Qunying, L., Cho, J.T., Chenggen, Q. (2006). The study of Chromeless Phase Lithography (CPL) for 45nm lithography. Proceedings of SPIE - The International Society for Optical Engineering 6349 I : -. ScholarBank@NUS Repository. https://doi.org/10.1117/12.685887 0819464449 0277786X http://scholarbank.nus.edu.sg/handle/10635/73949 000243620500086 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
topic CD
Chromeless
CPL
MEEF
Phase
spellingShingle CD
Chromeless
CPL
MEEF
Phase
Soon, Y.T.
Qunying, L.
Cho, J.T.
Chenggen, Q.
The study of Chromeless Phase Lithography (CPL) for 45nm lithography
description 10.1117/12.685887
author2 MECHANICAL ENGINEERING
author_facet MECHANICAL ENGINEERING
Soon, Y.T.
Qunying, L.
Cho, J.T.
Chenggen, Q.
format Conference or Workshop Item
author Soon, Y.T.
Qunying, L.
Cho, J.T.
Chenggen, Q.
author_sort Soon, Y.T.
title The study of Chromeless Phase Lithography (CPL) for 45nm lithography
title_short The study of Chromeless Phase Lithography (CPL) for 45nm lithography
title_full The study of Chromeless Phase Lithography (CPL) for 45nm lithography
title_fullStr The study of Chromeless Phase Lithography (CPL) for 45nm lithography
title_full_unstemmed The study of Chromeless Phase Lithography (CPL) for 45nm lithography
title_sort study of chromeless phase lithography (cpl) for 45nm lithography
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/73949
_version_ 1781783350362505216