The study of Chromeless Phase Lithography (CPL) for 45nm lithography

• Main Authors: Soon, Y.T., Qunying, L., Cho, J.T., Chenggen, Q.
• Other Authors: MECHANICAL ENGINEERING
• Format: Conference or Workshop Item
• Published: 2014
• Subjects: CD; Chromeless; CPL; MEEF; Phase
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/73949
• Institution: National University of Singapore

10.1117/12.685887