Analysis of the variation in the field-dependent behavior of thermally oxidized tantalum oxide films
10.1063/1.356020
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sg-nus-scholar.10635-802942023-10-30T20:20:44Z Analysis of the variation in the field-dependent behavior of thermally oxidized tantalum oxide films Choi, W.K. Ling, C.H. ELECTRICAL ENGINEERING 10.1063/1.356020 Journal of Applied Physics 75 8 3987-3990 2014-10-07T02:55:57Z 2014-10-07T02:55:57Z 1994 Article Choi, W.K., Ling, C.H. (1994). Analysis of the variation in the field-dependent behavior of thermally oxidized tantalum oxide films. Journal of Applied Physics 75 (8) : 3987-3990. ScholarBank@NUS Repository. https://doi.org/10.1063/1.356020 00218979 http://scholarbank.nus.edu.sg/handle/10635/80294 A1994NG57700040 Scopus |
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10.1063/1.356020 |
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ELECTRICAL ENGINEERING |
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ELECTRICAL ENGINEERING Choi, W.K. Ling, C.H. |
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Choi, W.K. Ling, C.H. |
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Choi, W.K. Ling, C.H. Analysis of the variation in the field-dependent behavior of thermally oxidized tantalum oxide films |
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Choi, W.K. |
title |
Analysis of the variation in the field-dependent behavior of thermally oxidized tantalum oxide films |
title_short |
Analysis of the variation in the field-dependent behavior of thermally oxidized tantalum oxide films |
title_full |
Analysis of the variation in the field-dependent behavior of thermally oxidized tantalum oxide films |
title_fullStr |
Analysis of the variation in the field-dependent behavior of thermally oxidized tantalum oxide films |
title_full_unstemmed |
Analysis of the variation in the field-dependent behavior of thermally oxidized tantalum oxide films |
title_sort |
analysis of the variation in the field-dependent behavior of thermally oxidized tantalum oxide films |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/80294 |
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