Analysis of the variation in the field-dependent behavior of thermally oxidized tantalum oxide films

10.1063/1.356020

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Bibliographic Details
Main Authors: Choi, W.K., Ling, C.H.
Other Authors: ELECTRICAL ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/80294
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Institution: National University of Singapore
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