Effects of tungsten polycidation on the hot-carrier degradation in buried-channel LDD p-MOSFET's

Japanese Journal of Applied Physics, Part 2: Letters

Saved in:
Bibliographic Details
Main Authors: Ang, D.S., Ling, C.H.
Other Authors: ELECTRICAL ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/80382
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore
Be the first to leave a comment!
You must be logged in first