Evaluation of rapid thermal nitrided ONO interpoly dielectric resistance to plasma process-induced damage

Evaluation of rapid thermal nitrided ONO interpoly dielectric resistance to plasma process-induced damage

International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings

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Bibliographic Details
Main Authors: Cha, C.L., Chor, E.F., Gong, H., Zhang, A.Q., Dong, Z., Chan, L.
Other Authors: ELECTRICAL ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/80402
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/80402

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