Fowler-nordheim stress degradation in gate oxide: Results from gate-to-drain capacitance and charge pumping current

10.1109/16.563376

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Main Authors:	Ling, C.H., Goh, Y.H., Ooi, J.A.
Other Authors:	ELECTRICAL ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/80451
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-80451
record_format	dspace
spelling	sg-nus-scholar.10635-804512023-10-30T20:20:22Z Fowler-nordheim stress degradation in gate oxide: Results from gate-to-drain capacitance and charge pumping current Ling, C.H. Goh, Y.H. Ooi, J.A. ELECTRICAL ENGINEERING 10.1109/16.563376 IEEE Transactions on Electron Devices 44 4 681-683 IETDA 2014-10-07T02:57:41Z 2014-10-07T02:57:41Z 1997 Article Ling, C.H., Goh, Y.H., Ooi, J.A. (1997). Fowler-nordheim stress degradation in gate oxide: Results from gate-to-drain capacitance and charge pumping current. IEEE Transactions on Electron Devices 44 (4) : 681-683. ScholarBank@NUS Repository. https://doi.org/10.1109/16.563376 00189383 http://scholarbank.nus.edu.sg/handle/10635/80451 A1997WQ14300025 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1109/16.563376
author2	ELECTRICAL ENGINEERING
author_facet	ELECTRICAL ENGINEERING Ling, C.H. Goh, Y.H. Ooi, J.A.
format	Article
author	Ling, C.H. Goh, Y.H. Ooi, J.A.
spellingShingle	Ling, C.H. Goh, Y.H. Ooi, J.A. Fowler-nordheim stress degradation in gate oxide: Results from gate-to-drain capacitance and charge pumping current
author_sort	Ling, C.H.
title	Fowler-nordheim stress degradation in gate oxide: Results from gate-to-drain capacitance and charge pumping current
title_short	Fowler-nordheim stress degradation in gate oxide: Results from gate-to-drain capacitance and charge pumping current
title_full	Fowler-nordheim stress degradation in gate oxide: Results from gate-to-drain capacitance and charge pumping current
title_fullStr	Fowler-nordheim stress degradation in gate oxide: Results from gate-to-drain capacitance and charge pumping current
title_full_unstemmed	Fowler-nordheim stress degradation in gate oxide: Results from gate-to-drain capacitance and charge pumping current
title_sort	fowler-nordheim stress degradation in gate oxide: results from gate-to-drain capacitance and charge pumping current
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/80451
_version_	1781783909755781120

Fowler-nordheim stress degradation in gate oxide: Results from gate-to-drain capacitance and charge pumping current

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