Influence of ion-beam energy and substrate temperature on the synthesis of carbon nitride thin films by nitrogen-ion-assisted pulsed laser deposition

Influence of ion-beam energy and substrate temperature on the synthesis of carbon nitride thin films by nitrogen-ion-assisted pulsed laser deposition

Journal of Applied Physics

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Bibliographic Details
Main Authors: Lu, Y.F., Ren, Z.M., Chong, T.C., Cheong, B.A., Pang, S.I., Wang, J.P., Li, K.
Other Authors: ELECTRICAL ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/80596
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Institution: National University of Singapore
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Summary:Journal of Applied Physics

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