Neutral electron trap generation and hole trapping in thin oxides under electrostatic discharge stress

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

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Bibliographic Details
Main Authors:	Chim, W.K., Teh, G.L.
Other Authors:	ELECTRICAL ENGINEERING
Format:	Article
Published:	2014
Subjects:	C-V measurement Electron trap Electrostatic discharge Hole trap MOS capacitor Neutral electron trap Oxide reliability Thin oxide Transmission line pulsing
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/80787
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-80787
record_format	dspace
spelling	sg-nus-scholar.10635-807872015-03-21T10:33:06Z Neutral electron trap generation and hole trapping in thin oxides under electrostatic discharge stress Chim, W.K. Teh, G.L. ELECTRICAL ENGINEERING C-V measurement Electron trap Electrostatic discharge Hole trap MOS capacitor Neutral electron trap Oxide reliability Thin oxide Transmission line pulsing Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 37 4 SUPPL. A 1671-1673 JAPND 2014-10-07T03:01:18Z 2014-10-07T03:01:18Z 1998-04 Article Chim, W.K.,Teh, G.L. (1998-04). Neutral electron trap generation and hole trapping in thin oxides under electrostatic discharge stress. Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 37 (4 SUPPL. A) : 1671-1673. ScholarBank@NUS Repository. 00214922 http://scholarbank.nus.edu.sg/handle/10635/80787 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
topic	C-V measurement Electron trap Electrostatic discharge Hole trap MOS capacitor Neutral electron trap Oxide reliability Thin oxide Transmission line pulsing
spellingShingle	C-V measurement Electron trap Electrostatic discharge Hole trap MOS capacitor Neutral electron trap Oxide reliability Thin oxide Transmission line pulsing Chim, W.K. Teh, G.L. Neutral electron trap generation and hole trapping in thin oxides under electrostatic discharge stress
description	Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
author2	ELECTRICAL ENGINEERING
author_facet	ELECTRICAL ENGINEERING Chim, W.K. Teh, G.L.
format	Article
author	Chim, W.K. Teh, G.L.
author_sort	Chim, W.K.
title	Neutral electron trap generation and hole trapping in thin oxides under electrostatic discharge stress
title_short	Neutral electron trap generation and hole trapping in thin oxides under electrostatic discharge stress
title_full	Neutral electron trap generation and hole trapping in thin oxides under electrostatic discharge stress
title_fullStr	Neutral electron trap generation and hole trapping in thin oxides under electrostatic discharge stress
title_full_unstemmed	Neutral electron trap generation and hole trapping in thin oxides under electrostatic discharge stress
title_sort	neutral electron trap generation and hole trapping in thin oxides under electrostatic discharge stress
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/80787
_version_	1681088952620023808

Neutral electron trap generation and hole trapping in thin oxides under electrostatic discharge stress

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