Numerical prediction of the etched profile in pyrolytic laser etching of silicon and gallium arsenide

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

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Main Authors:	Wee, T.-S., Lu, Y.-F., Chim, W.-K.
Other Authors:	ELECTRICAL ENGINEERING
Format:	Article
Published:	2014
Subjects:	Carbon tetrachloride Diffused reflection Gallium arsenide Heat conduction analysis Laser etched profile Laser induced temperature profile Numerical laser etching model Pyrolytic laser etching Silicon
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/80845
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-80845
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spelling	sg-nus-scholar.10635-808452015-01-07T08:32:09Z Numerical prediction of the etched profile in pyrolytic laser etching of silicon and gallium arsenide Wee, T.-S. Lu, Y.-F. Chim, W.-K. ELECTRICAL ENGINEERING Carbon tetrachloride Diffused reflection Gallium arsenide Heat conduction analysis Laser etched profile Laser induced temperature profile Numerical laser etching model Pyrolytic laser etching Silicon Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 36 8 5116-5124 JAPND 2014-10-07T03:01:55Z 2014-10-07T03:01:55Z 1997-08 Article Wee, T.-S.,Lu, Y.-F.,Chim, W.-K. (1997-08). Numerical prediction of the etched profile in pyrolytic laser etching of silicon and gallium arsenide. Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 36 (8) : 5116-5124. ScholarBank@NUS Repository. 00214922 http://scholarbank.nus.edu.sg/handle/10635/80845 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
topic	Carbon tetrachloride Diffused reflection Gallium arsenide Heat conduction analysis Laser etched profile Laser induced temperature profile Numerical laser etching model Pyrolytic laser etching Silicon
spellingShingle	Carbon tetrachloride Diffused reflection Gallium arsenide Heat conduction analysis Laser etched profile Laser induced temperature profile Numerical laser etching model Pyrolytic laser etching Silicon Wee, T.-S. Lu, Y.-F. Chim, W.-K. Numerical prediction of the etched profile in pyrolytic laser etching of silicon and gallium arsenide
description	Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
author2	ELECTRICAL ENGINEERING
author_facet	ELECTRICAL ENGINEERING Wee, T.-S. Lu, Y.-F. Chim, W.-K.
format	Article
author	Wee, T.-S. Lu, Y.-F. Chim, W.-K.
author_sort	Wee, T.-S.
title	Numerical prediction of the etched profile in pyrolytic laser etching of silicon and gallium arsenide
title_short	Numerical prediction of the etched profile in pyrolytic laser etching of silicon and gallium arsenide
title_full	Numerical prediction of the etched profile in pyrolytic laser etching of silicon and gallium arsenide
title_fullStr	Numerical prediction of the etched profile in pyrolytic laser etching of silicon and gallium arsenide
title_full_unstemmed	Numerical prediction of the etched profile in pyrolytic laser etching of silicon and gallium arsenide
title_sort	numerical prediction of the etched profile in pyrolytic laser etching of silicon and gallium arsenide
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/80845
_version_	1681088963249438720

Numerical prediction of the etched profile in pyrolytic laser etching of silicon and gallium arsenide

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