Numerical prediction of the etched profile in pyrolytic laser etching of silicon and gallium arsenide

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

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Bibliographic Details
Main Authors: Wee, T.-S., Lu, Y.-F., Chim, W.-K.
Other Authors: ELECTRICAL ENGINEERING
Format: Article
Published: 2014
Subjects:
Online Access:http://scholarbank.nus.edu.sg/handle/10635/80845
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Institution: National University of Singapore

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