Numerical prediction of the etched profile in pyrolytic laser etching of silicon and gallium arsenide

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

محفوظ في:
التفاصيل البيبلوغرافية
المؤلفون الرئيسيون: Wee, T.-S., Lu, Y.-F., Chim, W.-K.
مؤلفون آخرون: ELECTRICAL ENGINEERING
التنسيق: مقال
منشور في: 2014
الموضوعات:
الوصول للمادة أونلاين:http://scholarbank.nus.edu.sg/handle/10635/80845
الوسوم: إضافة وسم
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المؤسسة: National University of Singapore
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spelling sg-nus-scholar.10635-808452024-11-14T10:20:36Z Numerical prediction of the etched profile in pyrolytic laser etching of silicon and gallium arsenide Wee, T.-S. Lu, Y.-F. Chim, W.-K. ELECTRICAL ENGINEERING Carbon tetrachloride Diffused reflection Gallium arsenide Heat conduction analysis Laser etched profile Laser induced temperature profile Numerical laser etching model Pyrolytic laser etching Silicon Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 36 8 5116-5124 JAPND 2014-10-07T03:01:55Z 2014-10-07T03:01:55Z 1997-08 Article Wee, T.-S.,Lu, Y.-F.,Chim, W.-K. (1997-08). Numerical prediction of the etched profile in pyrolytic laser etching of silicon and gallium arsenide. Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 36 (8) : 5116-5124. ScholarBank@NUS Repository. 00214922 http://scholarbank.nus.edu.sg/handle/10635/80845 NOT_IN_WOS Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
topic Carbon tetrachloride
Diffused reflection
Gallium arsenide
Heat conduction analysis
Laser etched profile
Laser induced temperature profile
Numerical laser etching model
Pyrolytic laser etching
Silicon
spellingShingle Carbon tetrachloride
Diffused reflection
Gallium arsenide
Heat conduction analysis
Laser etched profile
Laser induced temperature profile
Numerical laser etching model
Pyrolytic laser etching
Silicon
Wee, T.-S.
Lu, Y.-F.
Chim, W.-K.
Numerical prediction of the etched profile in pyrolytic laser etching of silicon and gallium arsenide
description Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
author2 ELECTRICAL ENGINEERING
author_facet ELECTRICAL ENGINEERING
Wee, T.-S.
Lu, Y.-F.
Chim, W.-K.
format Article
author Wee, T.-S.
Lu, Y.-F.
Chim, W.-K.
author_sort Wee, T.-S.
title Numerical prediction of the etched profile in pyrolytic laser etching of silicon and gallium arsenide
title_short Numerical prediction of the etched profile in pyrolytic laser etching of silicon and gallium arsenide
title_full Numerical prediction of the etched profile in pyrolytic laser etching of silicon and gallium arsenide
title_fullStr Numerical prediction of the etched profile in pyrolytic laser etching of silicon and gallium arsenide
title_full_unstemmed Numerical prediction of the etched profile in pyrolytic laser etching of silicon and gallium arsenide
title_sort numerical prediction of the etched profile in pyrolytic laser etching of silicon and gallium arsenide
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/80845
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