Quasi-static and high frequency C-V measurements on Al/Ta2O5/SiO2/Si

Thin Solid Films

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Main Authors:	Sundaram, K., Choi, W.K., Ling, C.H.
Other Authors:	ELECTRICAL ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/81037
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-81037
record_format	dspace
spelling	sg-nus-scholar.10635-810372015-02-10T23:36:48Z Quasi-static and high frequency C-V measurements on Al/Ta2O5/SiO2/Si Sundaram, K. Choi, W.K. Ling, C.H. ELECTRICAL ENGINEERING Thin Solid Films 230 2 145-149 THSFA 2014-10-07T03:03:59Z 2014-10-07T03:03:59Z 1993-08-10 Article Sundaram, K.,Choi, W.K.,Ling, C.H. (1993-08-10). Quasi-static and high frequency C-V measurements on Al/Ta2O5/SiO2/Si. Thin Solid Films 230 (2) : 145-149. ScholarBank@NUS Repository. 00406090 http://scholarbank.nus.edu.sg/handle/10635/81037 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
description	Thin Solid Films
author2	ELECTRICAL ENGINEERING
author_facet	ELECTRICAL ENGINEERING Sundaram, K. Choi, W.K. Ling, C.H.
format	Article
author	Sundaram, K. Choi, W.K. Ling, C.H.
spellingShingle	Sundaram, K. Choi, W.K. Ling, C.H. Quasi-static and high frequency C-V measurements on Al/Ta2O5/SiO2/Si
author_sort	Sundaram, K.
title	Quasi-static and high frequency C-V measurements on Al/Ta2O5/SiO2/Si
title_short	Quasi-static and high frequency C-V measurements on Al/Ta2O5/SiO2/Si
title_full	Quasi-static and high frequency C-V measurements on Al/Ta2O5/SiO2/Si
title_fullStr	Quasi-static and high frequency C-V measurements on Al/Ta2O5/SiO2/Si
title_full_unstemmed	Quasi-static and high frequency C-V measurements on Al/Ta2O5/SiO2/Si
title_sort	quasi-static and high frequency c-v measurements on al/ta2o5/sio2/si
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/81037
_version_	1681088998307528704

Quasi-static and high frequency C-V measurements on Al/Ta2O5/SiO2/Si

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