Structural properties of amorphous silicon carbide films by plasma-enhanced chemical vapor deposition
10.1063/1.359006
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sg-nus-scholar.10635-812262023-10-26T09:37:46Z Structural properties of amorphous silicon carbide films by plasma-enhanced chemical vapor deposition Choi, W.K. Chan, Y.M. Ling, C.H. Lee, Y. Gopalakrishnan, R. Tan, K.L. INSTITUTE OF MICROELECTRONICS ELECTRICAL ENGINEERING PHYSICS 10.1063/1.359006 Journal of Applied Physics 77 2 827-832 2014-10-07T03:06:00Z 2014-10-07T03:06:00Z 1995 Article Choi, W.K., Chan, Y.M., Ling, C.H., Lee, Y., Gopalakrishnan, R., Tan, K.L. (1995). Structural properties of amorphous silicon carbide films by plasma-enhanced chemical vapor deposition. Journal of Applied Physics 77 (2) : 827-832. ScholarBank@NUS Repository. https://doi.org/10.1063/1.359006 00218979 http://scholarbank.nus.edu.sg/handle/10635/81226 A1995QB22300055 Scopus |
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National University of Singapore |
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Asia |
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Singapore Singapore |
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ScholarBank@NUS |
| description |
10.1063/1.359006 |
| author2 |
INSTITUTE OF MICROELECTRONICS |
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INSTITUTE OF MICROELECTRONICS Choi, W.K. Chan, Y.M. Ling, C.H. Lee, Y. Gopalakrishnan, R. Tan, K.L. |
| format |
Article |
| author |
Choi, W.K. Chan, Y.M. Ling, C.H. Lee, Y. Gopalakrishnan, R. Tan, K.L. |
| spellingShingle |
Choi, W.K. Chan, Y.M. Ling, C.H. Lee, Y. Gopalakrishnan, R. Tan, K.L. Structural properties of amorphous silicon carbide films by plasma-enhanced chemical vapor deposition |
| author_sort |
Choi, W.K. |
| title |
Structural properties of amorphous silicon carbide films by plasma-enhanced chemical vapor deposition |
| title_short |
Structural properties of amorphous silicon carbide films by plasma-enhanced chemical vapor deposition |
| title_full |
Structural properties of amorphous silicon carbide films by plasma-enhanced chemical vapor deposition |
| title_fullStr |
Structural properties of amorphous silicon carbide films by plasma-enhanced chemical vapor deposition |
| title_full_unstemmed |
Structural properties of amorphous silicon carbide films by plasma-enhanced chemical vapor deposition |
| title_sort |
structural properties of amorphous silicon carbide films by plasma-enhanced chemical vapor deposition |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/81226 |
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1781783977292464128 |