Structural properties of amorphous silicon carbide films by plasma-enhanced chemical vapor deposition

10.1063/1.359006

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Bibliographic Details
Main Authors:	Choi, W.K., Chan, Y.M., Ling, C.H., Lee, Y., Gopalakrishnan, R., Tan, K.L.
Other Authors:	INSTITUTE OF MICROELECTRONICS
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/81226
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Institution:	National University of Singapore

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