Structural properties of amorphous silicon carbide films by plasma-enhanced chemical vapor deposition
10.1063/1.359006
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Main Authors: | Choi, W.K., Chan, Y.M., Ling, C.H., Lee, Y., Gopalakrishnan, R., Tan, K.L. |
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Other Authors: | INSTITUTE OF MICROELECTRONICS |
Format: | Article |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/81226 |
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Institution: | National University of Singapore |
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