Inductively coupled plasma chemical vapor deposition system for the synthesis of nanostructured thin films
In this work, we propose a custom-designed inductively coupled plasma chemical vapor deposition (ICP-CVD) system as an alternative manufacturing approach for nanostructured materials.
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| 格式: | Theses and Dissertations |
| 出版: |
2008
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| 主題: | |
| 在線閱讀: | http://hdl.handle.net/10356/4588 |
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| 機構: | Nanyang Technological University |