Inductively coupled plasma chemical vapor deposition system for the synthesis of nanostructured thin films

Inductively coupled plasma chemical vapor deposition system for the synthesis of nanostructured thin films

In this work, we propose a custom-designed inductively coupled plasma chemical vapor deposition (ICP-CVD) system as an alternative manufacturing approach for nanostructured materials.

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Bibliographic Details
Main Author: Lee, Yi Chau.
Other Authors: Tan, Ooi Kiang
Format: Theses and Dissertations
Published: 2008
Subjects:
DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials
Online Access:http://hdl.handle.net/10356/4588
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Institution: Nanyang Technological University

Internet

http://hdl.handle.net/10356/4588

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