Inductively coupled plasma chemical vapor deposition system for the synthesis of nanostructured thin films
In this work, we propose a custom-designed inductively coupled plasma chemical vapor deposition (ICP-CVD) system as an alternative manufacturing approach for nanostructured materials.
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2008
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sg-ntu-dr.10356-45882023-07-04T15:58:23Z Inductively coupled plasma chemical vapor deposition system for the synthesis of nanostructured thin films Lee, Yi Chau. Tan, Ooi Kiang School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials In this work, we propose a custom-designed inductively coupled plasma chemical vapor deposition (ICP-CVD) system as an alternative manufacturing approach for nanostructured materials. Master of Engineering 2008-09-17T09:54:51Z 2008-09-17T09:54:51Z 2004 2004 Thesis http://hdl.handle.net/10356/4588 Nanyang Technological University application/pdf |
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DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials Lee, Yi Chau. Inductively coupled plasma chemical vapor deposition system for the synthesis of nanostructured thin films |
description |
In this work, we propose a custom-designed inductively coupled plasma chemical vapor deposition (ICP-CVD) system as an alternative manufacturing approach for nanostructured materials. |
author2 |
Tan, Ooi Kiang |
author_facet |
Tan, Ooi Kiang Lee, Yi Chau. |
format |
Theses and Dissertations |
author |
Lee, Yi Chau. |
author_sort |
Lee, Yi Chau. |
title |
Inductively coupled plasma chemical vapor deposition system for the synthesis of nanostructured thin films |
title_short |
Inductively coupled plasma chemical vapor deposition system for the synthesis of nanostructured thin films |
title_full |
Inductively coupled plasma chemical vapor deposition system for the synthesis of nanostructured thin films |
title_fullStr |
Inductively coupled plasma chemical vapor deposition system for the synthesis of nanostructured thin films |
title_full_unstemmed |
Inductively coupled plasma chemical vapor deposition system for the synthesis of nanostructured thin films |
title_sort |
inductively coupled plasma chemical vapor deposition system for the synthesis of nanostructured thin films |
publishDate |
2008 |
url |
http://hdl.handle.net/10356/4588 |
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1772825441160134656 |