Inductively coupled plasma chemical vapor deposition system for the synthesis of nanostructured thin films

In this work, we propose a custom-designed inductively coupled plasma chemical vapor deposition (ICP-CVD) system as an alternative manufacturing approach for nanostructured materials.

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Bibliographic Details
Main Author: Lee, Yi Chau.
Other Authors: Tan, Ooi Kiang
Format: Theses and Dissertations
Published: 2008
Subjects:
Online Access:http://hdl.handle.net/10356/4588
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Institution: Nanyang Technological University
id sg-ntu-dr.10356-4588
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spelling sg-ntu-dr.10356-45882023-07-04T15:58:23Z Inductively coupled plasma chemical vapor deposition system for the synthesis of nanostructured thin films Lee, Yi Chau. Tan, Ooi Kiang School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials In this work, we propose a custom-designed inductively coupled plasma chemical vapor deposition (ICP-CVD) system as an alternative manufacturing approach for nanostructured materials. Master of Engineering 2008-09-17T09:54:51Z 2008-09-17T09:54:51Z 2004 2004 Thesis http://hdl.handle.net/10356/4588 Nanyang Technological University application/pdf
institution Nanyang Technological University
building NTU Library
continent Asia
country Singapore
Singapore
content_provider NTU Library
collection DR-NTU
topic DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials
spellingShingle DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials
Lee, Yi Chau.
Inductively coupled plasma chemical vapor deposition system for the synthesis of nanostructured thin films
description In this work, we propose a custom-designed inductively coupled plasma chemical vapor deposition (ICP-CVD) system as an alternative manufacturing approach for nanostructured materials.
author2 Tan, Ooi Kiang
author_facet Tan, Ooi Kiang
Lee, Yi Chau.
format Theses and Dissertations
author Lee, Yi Chau.
author_sort Lee, Yi Chau.
title Inductively coupled plasma chemical vapor deposition system for the synthesis of nanostructured thin films
title_short Inductively coupled plasma chemical vapor deposition system for the synthesis of nanostructured thin films
title_full Inductively coupled plasma chemical vapor deposition system for the synthesis of nanostructured thin films
title_fullStr Inductively coupled plasma chemical vapor deposition system for the synthesis of nanostructured thin films
title_full_unstemmed Inductively coupled plasma chemical vapor deposition system for the synthesis of nanostructured thin films
title_sort inductively coupled plasma chemical vapor deposition system for the synthesis of nanostructured thin films
publishDate 2008
url http://hdl.handle.net/10356/4588
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