Inductively coupled plasma chemical vapor deposition system for the synthesis of nanostructured thin films

• Main Author: Lee, Yi Chau.
• Other Authors: Tan, Ooi Kiang
• Format: Theses and Dissertations
• Published: 2008
• Subjects: DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials
• Online Access: http://hdl.handle.net/10356/4588
• Institution: Nanyang Technological University

In this work, we propose a custom-designed inductively coupled plasma chemical vapor deposition (ICP-CVD) system as an alternative manufacturing approach for nanostructured materials.