New type of local defects in very thin silicon dioxide films on arsenic-implanted p-type silicon

New type of local defects in very thin silicon dioxide films on arsenic-implanted p-type silicon

Proceedings of the International Symposium on the Physical 7 Failure Analysis of Integrated Circuits, IPFA

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Bibliographic Details
Main Authors: Lau, W.S., Pey, K.S., Ng, W.T., Sane, V., Heng, J.M.C., Phang, J.C.H., Chan, D.S.H., Chua, C.M., Cronquist, B., Lee, Bob
Other Authors: ELECTRICAL ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/81602
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Institution: National University of Singapore
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Summary:Proceedings of the International Symposium on the Physical 7 Failure Analysis of Integrated Circuits, IPFA

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