Advanced HfTaON/SiO2 gate stack with high mobility and low leakage current for low-standby-power application

10.1109/LED.2006.875722

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Bibliographic Details
Main Authors:	Yu, X., Yu, M., Zhu, C.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Subjects:	High-κ gate dielectric Interface-state density (Dit) Metal gate Mobility MOSFETs Tthermal stability
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/81940
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-81940
record_format	dspace
spelling	sg-nus-scholar.10635-819402023-10-26T08:07:36Z Advanced HfTaON/SiO2 gate stack with high mobility and low leakage current for low-standby-power application Yu, X. Yu, M. Zhu, C. ELECTRICAL & COMPUTER ENGINEERING High-κ gate dielectric Interface-state density (Dit) Metal gate Mobility MOSFETs Tthermal stability 10.1109/LED.2006.875722 IEEE Electron Device Letters 27 6 498-501 EDLED 2014-10-07T04:23:29Z 2014-10-07T04:23:29Z 2006-06 Article Yu, X., Yu, M., Zhu, C. (2006-06). Advanced HfTaON/SiO2 gate stack with high mobility and low leakage current for low-standby-power application. IEEE Electron Device Letters 27 (6) : 498-501. ScholarBank@NUS Repository. https://doi.org/10.1109/LED.2006.875722 07413106 http://scholarbank.nus.edu.sg/handle/10635/81940 000238070500024 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	High-κ gate dielectric Interface-state density (Dit) Metal gate Mobility MOSFETs Tthermal stability
spellingShingle	High-κ gate dielectric Interface-state density (Dit) Metal gate Mobility MOSFETs Tthermal stability Yu, X. Yu, M. Zhu, C. Advanced HfTaON/SiO2 gate stack with high mobility and low leakage current for low-standby-power application
description	10.1109/LED.2006.875722
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Yu, X. Yu, M. Zhu, C.
format	Article
author	Yu, X. Yu, M. Zhu, C.
author_sort	Yu, X.
title	Advanced HfTaON/SiO2 gate stack with high mobility and low leakage current for low-standby-power application
title_short	Advanced HfTaON/SiO2 gate stack with high mobility and low leakage current for low-standby-power application
title_full	Advanced HfTaON/SiO2 gate stack with high mobility and low leakage current for low-standby-power application
title_fullStr	Advanced HfTaON/SiO2 gate stack with high mobility and low leakage current for low-standby-power application
title_full_unstemmed	Advanced HfTaON/SiO2 gate stack with high mobility and low leakage current for low-standby-power application
title_sort	advanced hftaon/sio2 gate stack with high mobility and low leakage current for low-standby-power application
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/81940
_version_	1781784021905178624

Advanced HfTaON/SiO2 gate stack with high mobility and low leakage current for low-standby-power application

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