Atomic-layer-deposited Al2O3-HfO2-Al 2O3 dielectrics for metal-insulator-metal capacitor applications
10.1063/1.2005397
Saved in:
| Main Authors: | , , , |
|---|---|
| Other Authors: | |
| Format: | Article |
| Published: |
2014
|
| Online Access: | http://scholarbank.nus.edu.sg/handle/10635/81990 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| Institution: | National University of Singapore |
| id |
sg-nus-scholar.10635-81990 |
|---|---|
| record_format |
dspace |
| spelling |
sg-nus-scholar.10635-819902023-10-26T21:11:34Z Atomic-layer-deposited Al2O3-HfO2-Al 2O3 dielectrics for metal-insulator-metal capacitor applications Ding, S.-J. Zhu, C. Li, M.-F. Zhang, D.W. ELECTRICAL & COMPUTER ENGINEERING 10.1063/1.2005397 Applied Physics Letters 87 5 - APPLA 2014-10-07T04:24:05Z 2014-10-07T04:24:05Z 2005 Article Ding, S.-J., Zhu, C., Li, M.-F., Zhang, D.W. (2005). Atomic-layer-deposited Al2O3-HfO2-Al 2O3 dielectrics for metal-insulator-metal capacitor applications. Applied Physics Letters 87 (5) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.2005397 00036951 http://scholarbank.nus.edu.sg/handle/10635/81990 000230886100062 Scopus |
| institution |
National University of Singapore |
| building |
NUS Library |
| continent |
Asia |
| country |
Singapore Singapore |
| content_provider |
NUS Library |
| collection |
ScholarBank@NUS |
| description |
10.1063/1.2005397 |
| author2 |
ELECTRICAL & COMPUTER ENGINEERING |
| author_facet |
ELECTRICAL & COMPUTER ENGINEERING Ding, S.-J. Zhu, C. Li, M.-F. Zhang, D.W. |
| format |
Article |
| author |
Ding, S.-J. Zhu, C. Li, M.-F. Zhang, D.W. |
| spellingShingle |
Ding, S.-J. Zhu, C. Li, M.-F. Zhang, D.W. Atomic-layer-deposited Al2O3-HfO2-Al 2O3 dielectrics for metal-insulator-metal capacitor applications |
| author_sort |
Ding, S.-J. |
| title |
Atomic-layer-deposited Al2O3-HfO2-Al 2O3 dielectrics for metal-insulator-metal capacitor applications |
| title_short |
Atomic-layer-deposited Al2O3-HfO2-Al 2O3 dielectrics for metal-insulator-metal capacitor applications |
| title_full |
Atomic-layer-deposited Al2O3-HfO2-Al 2O3 dielectrics for metal-insulator-metal capacitor applications |
| title_fullStr |
Atomic-layer-deposited Al2O3-HfO2-Al 2O3 dielectrics for metal-insulator-metal capacitor applications |
| title_full_unstemmed |
Atomic-layer-deposited Al2O3-HfO2-Al 2O3 dielectrics for metal-insulator-metal capacitor applications |
| title_sort |
atomic-layer-deposited al2o3-hfo2-al 2o3 dielectrics for metal-insulator-metal capacitor applications |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/81990 |
| _version_ |
1781784033345142784 |