Au-free normally-off AlGaN/GaN-on-Si MIS-HEMTs using combined partially recessed and fluorinated trap-charge gate structures

10.1109/LED.2014.2310851

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Main Authors: Huang, H., Liang, Y.C., Samudra, G.S., Ngo, C.L.L.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
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Online Access:http://scholarbank.nus.edu.sg/handle/10635/81993
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spelling sg-nus-scholar.10635-819932023-10-30T08:08:18Z Au-free normally-off AlGaN/GaN-on-Si MIS-HEMTs using combined partially recessed and fluorinated trap-charge gate structures Huang, H. Liang, Y.C. Samudra, G.S. Ngo, C.L.L. ELECTRICAL & COMPUTER ENGINEERING AlGaN/GaN HEMTs Au-free gate trench normally-off plasma treatment. 10.1109/LED.2014.2310851 IEEE Electron Device Letters 35 5 569-571 EDLED 2014-10-07T04:24:07Z 2014-10-07T04:24:07Z 2014 Article Huang, H., Liang, Y.C., Samudra, G.S., Ngo, C.L.L. (2014). Au-free normally-off AlGaN/GaN-on-Si MIS-HEMTs using combined partially recessed and fluorinated trap-charge gate structures. IEEE Electron Device Letters 35 (5) : 569-571. ScholarBank@NUS Repository. https://doi.org/10.1109/LED.2014.2310851 07413106 http://scholarbank.nus.edu.sg/handle/10635/81993 000335147600023 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
topic AlGaN/GaN HEMTs
Au-free
gate trench
normally-off
plasma treatment.
spellingShingle AlGaN/GaN HEMTs
Au-free
gate trench
normally-off
plasma treatment.
Huang, H.
Liang, Y.C.
Samudra, G.S.
Ngo, C.L.L.
Au-free normally-off AlGaN/GaN-on-Si MIS-HEMTs using combined partially recessed and fluorinated trap-charge gate structures
description 10.1109/LED.2014.2310851
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Huang, H.
Liang, Y.C.
Samudra, G.S.
Ngo, C.L.L.
format Article
author Huang, H.
Liang, Y.C.
Samudra, G.S.
Ngo, C.L.L.
author_sort Huang, H.
title Au-free normally-off AlGaN/GaN-on-Si MIS-HEMTs using combined partially recessed and fluorinated trap-charge gate structures
title_short Au-free normally-off AlGaN/GaN-on-Si MIS-HEMTs using combined partially recessed and fluorinated trap-charge gate structures
title_full Au-free normally-off AlGaN/GaN-on-Si MIS-HEMTs using combined partially recessed and fluorinated trap-charge gate structures
title_fullStr Au-free normally-off AlGaN/GaN-on-Si MIS-HEMTs using combined partially recessed and fluorinated trap-charge gate structures
title_full_unstemmed Au-free normally-off AlGaN/GaN-on-Si MIS-HEMTs using combined partially recessed and fluorinated trap-charge gate structures
title_sort au-free normally-off algan/gan-on-si mis-hemts using combined partially recessed and fluorinated trap-charge gate structures
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/81993
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