Au-free normally-off AlGaN/GaN-on-Si MIS-HEMTs using combined partially recessed and fluorinated trap-charge gate structures
10.1109/LED.2014.2310851
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sg-nus-scholar.10635-819932023-10-30T08:08:18Z Au-free normally-off AlGaN/GaN-on-Si MIS-HEMTs using combined partially recessed and fluorinated trap-charge gate structures Huang, H. Liang, Y.C. Samudra, G.S. Ngo, C.L.L. ELECTRICAL & COMPUTER ENGINEERING AlGaN/GaN HEMTs Au-free gate trench normally-off plasma treatment. 10.1109/LED.2014.2310851 IEEE Electron Device Letters 35 5 569-571 EDLED 2014-10-07T04:24:07Z 2014-10-07T04:24:07Z 2014 Article Huang, H., Liang, Y.C., Samudra, G.S., Ngo, C.L.L. (2014). Au-free normally-off AlGaN/GaN-on-Si MIS-HEMTs using combined partially recessed and fluorinated trap-charge gate structures. IEEE Electron Device Letters 35 (5) : 569-571. ScholarBank@NUS Repository. https://doi.org/10.1109/LED.2014.2310851 07413106 http://scholarbank.nus.edu.sg/handle/10635/81993 000335147600023 Scopus |
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AlGaN/GaN HEMTs Au-free gate trench normally-off plasma treatment. |
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AlGaN/GaN HEMTs Au-free gate trench normally-off plasma treatment. Huang, H. Liang, Y.C. Samudra, G.S. Ngo, C.L.L. Au-free normally-off AlGaN/GaN-on-Si MIS-HEMTs using combined partially recessed and fluorinated trap-charge gate structures |
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10.1109/LED.2014.2310851 |
author2 |
ELECTRICAL & COMPUTER ENGINEERING |
author_facet |
ELECTRICAL & COMPUTER ENGINEERING Huang, H. Liang, Y.C. Samudra, G.S. Ngo, C.L.L. |
format |
Article |
author |
Huang, H. Liang, Y.C. Samudra, G.S. Ngo, C.L.L. |
author_sort |
Huang, H. |
title |
Au-free normally-off AlGaN/GaN-on-Si MIS-HEMTs using combined partially recessed and fluorinated trap-charge gate structures |
title_short |
Au-free normally-off AlGaN/GaN-on-Si MIS-HEMTs using combined partially recessed and fluorinated trap-charge gate structures |
title_full |
Au-free normally-off AlGaN/GaN-on-Si MIS-HEMTs using combined partially recessed and fluorinated trap-charge gate structures |
title_fullStr |
Au-free normally-off AlGaN/GaN-on-Si MIS-HEMTs using combined partially recessed and fluorinated trap-charge gate structures |
title_full_unstemmed |
Au-free normally-off AlGaN/GaN-on-Si MIS-HEMTs using combined partially recessed and fluorinated trap-charge gate structures |
title_sort |
au-free normally-off algan/gan-on-si mis-hemts using combined partially recessed and fluorinated trap-charge gate structures |
publishDate |
2014 |
url |
http://scholarbank.nus.edu.sg/handle/10635/81993 |
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1781784034092777472 |