Charge trapping and breakdown mechanism in HfAlO/TaN gate stack analyzed using carrier separation

10.1109/TDMR.2004.838416

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Main Authors: Loh, W.-Y., Cho, B.J., Joo, M.S., Li, M.-F., Chan, D.S.H., Mathew, S., Kwong, D.-L.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
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Online Access:http://scholarbank.nus.edu.sg/handle/10635/82049
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spelling sg-nus-scholar.10635-820492023-10-26T09:10:16Z Charge trapping and breakdown mechanism in HfAlO/TaN gate stack analyzed using carrier separation Loh, W.-Y. Cho, B.J. Joo, M.S. Li, M.-F. Chan, D.S.H. Mathew, S. Kwong, D.-L. ELECTRICAL & COMPUTER ENGINEERING Gate leakage current Gate stacks High-K dielectrics Reliability Tunneling 10.1109/TDMR.2004.838416 IEEE Transactions on Device and Materials Reliability 4 4 696-703 2014-10-07T04:24:47Z 2014-10-07T04:24:47Z 2004-12 Article Loh, W.-Y., Cho, B.J., Joo, M.S., Li, M.-F., Chan, D.S.H., Mathew, S., Kwong, D.-L. (2004-12). Charge trapping and breakdown mechanism in HfAlO/TaN gate stack analyzed using carrier separation. IEEE Transactions on Device and Materials Reliability 4 (4) : 696-703. ScholarBank@NUS Repository. https://doi.org/10.1109/TDMR.2004.838416 15304388 http://scholarbank.nus.edu.sg/handle/10635/82049 000226617100017 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
topic Gate leakage current
Gate stacks
High-K dielectrics
Reliability
Tunneling
spellingShingle Gate leakage current
Gate stacks
High-K dielectrics
Reliability
Tunneling
Loh, W.-Y.
Cho, B.J.
Joo, M.S.
Li, M.-F.
Chan, D.S.H.
Mathew, S.
Kwong, D.-L.
Charge trapping and breakdown mechanism in HfAlO/TaN gate stack analyzed using carrier separation
description 10.1109/TDMR.2004.838416
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Loh, W.-Y.
Cho, B.J.
Joo, M.S.
Li, M.-F.
Chan, D.S.H.
Mathew, S.
Kwong, D.-L.
format Article
author Loh, W.-Y.
Cho, B.J.
Joo, M.S.
Li, M.-F.
Chan, D.S.H.
Mathew, S.
Kwong, D.-L.
author_sort Loh, W.-Y.
title Charge trapping and breakdown mechanism in HfAlO/TaN gate stack analyzed using carrier separation
title_short Charge trapping and breakdown mechanism in HfAlO/TaN gate stack analyzed using carrier separation
title_full Charge trapping and breakdown mechanism in HfAlO/TaN gate stack analyzed using carrier separation
title_fullStr Charge trapping and breakdown mechanism in HfAlO/TaN gate stack analyzed using carrier separation
title_full_unstemmed Charge trapping and breakdown mechanism in HfAlO/TaN gate stack analyzed using carrier separation
title_sort charge trapping and breakdown mechanism in hfalo/tan gate stack analyzed using carrier separation
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/82049
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