Dewetting of resist/metal bilayers in resist stripping processes

10.1063/1.1374234

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Bibliographic Details
Main Authors:	Wu, Y., Qiao, P., Chong, T., Low, T.-S., Xie, H., Luo, P., Guo, Z., Qiu, J.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/82151
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Institution:	National University of Singapore

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Summary:	10.1063/1.1374234

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