Dewetting of resist/metal bilayers in resist stripping processes

• Main Authors: Wu, Y., Qiao, P., Chong, T., Low, T.-S., Xie, H., Luo, P., Guo, Z., Qiu, J.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Article
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/82151
• Institution: National University of Singapore

10.1063/1.1374234