Effect of substitutional carbon concentration on Schottky-barrier height of nickel silicide formed on epitaxial silicon-carbon films

10.1063/1.3197144

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Main Authors: Lim, P.S.Y., Lee, R.T.P., Sinha, M., Chi, D.Z., Yeo, Y.-C.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/82212
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spelling sg-nus-scholar.10635-822122023-10-30T23:01:53Z Effect of substitutional carbon concentration on Schottky-barrier height of nickel silicide formed on epitaxial silicon-carbon films Lim, P.S.Y. Lee, R.T.P. Sinha, M. Chi, D.Z. Yeo, Y.-C. ELECTRICAL & COMPUTER ENGINEERING 10.1063/1.3197144 Journal of Applied Physics 106 4 - JAPIA 2014-10-07T04:26:42Z 2014-10-07T04:26:42Z 2009 Article Lim, P.S.Y., Lee, R.T.P., Sinha, M., Chi, D.Z., Yeo, Y.-C. (2009). Effect of substitutional carbon concentration on Schottky-barrier height of nickel silicide formed on epitaxial silicon-carbon films. Journal of Applied Physics 106 (4) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.3197144 00218979 http://scholarbank.nus.edu.sg/handle/10635/82212 000270083800044 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1063/1.3197144
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Lim, P.S.Y.
Lee, R.T.P.
Sinha, M.
Chi, D.Z.
Yeo, Y.-C.
format Article
author Lim, P.S.Y.
Lee, R.T.P.
Sinha, M.
Chi, D.Z.
Yeo, Y.-C.
spellingShingle Lim, P.S.Y.
Lee, R.T.P.
Sinha, M.
Chi, D.Z.
Yeo, Y.-C.
Effect of substitutional carbon concentration on Schottky-barrier height of nickel silicide formed on epitaxial silicon-carbon films
author_sort Lim, P.S.Y.
title Effect of substitutional carbon concentration on Schottky-barrier height of nickel silicide formed on epitaxial silicon-carbon films
title_short Effect of substitutional carbon concentration on Schottky-barrier height of nickel silicide formed on epitaxial silicon-carbon films
title_full Effect of substitutional carbon concentration on Schottky-barrier height of nickel silicide formed on epitaxial silicon-carbon films
title_fullStr Effect of substitutional carbon concentration on Schottky-barrier height of nickel silicide formed on epitaxial silicon-carbon films
title_full_unstemmed Effect of substitutional carbon concentration on Schottky-barrier height of nickel silicide formed on epitaxial silicon-carbon films
title_sort effect of substitutional carbon concentration on schottky-barrier height of nickel silicide formed on epitaxial silicon-carbon films
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/82212
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