Effects of SiO2/Si3N4 hard masks on etching properties of metal gates
10.1116/1.2382950
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sg-nus-scholar.10635-822362023-10-30T23:02:39Z Effects of SiO2/Si3N4 hard masks on etching properties of metal gates Hwang, W.S. Cho, B.-J. Chan, D.S.H. Bliznetsov, V. Yoo, W.J. ELECTRICAL & COMPUTER ENGINEERING 10.1116/1.2382950 Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 24 6 2689-2694 JVTBD 2014-10-07T04:26:59Z 2014-10-07T04:26:59Z 2006 Article Hwang, W.S., Cho, B.-J., Chan, D.S.H., Bliznetsov, V., Yoo, W.J. (2006). Effects of SiO2/Si3N4 hard masks on etching properties of metal gates. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 24 (6) : 2689-2694. ScholarBank@NUS Repository. https://doi.org/10.1116/1.2382950 10711023 http://scholarbank.nus.edu.sg/handle/10635/82236 000243324400034 Scopus |
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ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING Hwang, W.S. Cho, B.-J. Chan, D.S.H. Bliznetsov, V. Yoo, W.J. |
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Hwang, W.S. Cho, B.-J. Chan, D.S.H. Bliznetsov, V. Yoo, W.J. |
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Hwang, W.S. Cho, B.-J. Chan, D.S.H. Bliznetsov, V. Yoo, W.J. Effects of SiO2/Si3N4 hard masks on etching properties of metal gates |
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Hwang, W.S. |
title |
Effects of SiO2/Si3N4 hard masks on etching properties of metal gates |
title_short |
Effects of SiO2/Si3N4 hard masks on etching properties of metal gates |
title_full |
Effects of SiO2/Si3N4 hard masks on etching properties of metal gates |
title_fullStr |
Effects of SiO2/Si3N4 hard masks on etching properties of metal gates |
title_full_unstemmed |
Effects of SiO2/Si3N4 hard masks on etching properties of metal gates |
title_sort |
effects of sio2/si3n4 hard masks on etching properties of metal gates |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/82236 |
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