Effects of SiO2/Si3N4 hard masks on etching properties of metal gates

10.1116/1.2382950

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Bibliographic Details
Main Authors: Hwang, W.S., Cho, B.-J., Chan, D.S.H., Bliznetsov, V., Yoo, W.J.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/82236
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-822362023-10-30T23:02:39Z Effects of SiO2/Si3N4 hard masks on etching properties of metal gates Hwang, W.S. Cho, B.-J. Chan, D.S.H. Bliznetsov, V. Yoo, W.J. ELECTRICAL & COMPUTER ENGINEERING 10.1116/1.2382950 Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 24 6 2689-2694 JVTBD 2014-10-07T04:26:59Z 2014-10-07T04:26:59Z 2006 Article Hwang, W.S., Cho, B.-J., Chan, D.S.H., Bliznetsov, V., Yoo, W.J. (2006). Effects of SiO2/Si3N4 hard masks on etching properties of metal gates. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 24 (6) : 2689-2694. ScholarBank@NUS Repository. https://doi.org/10.1116/1.2382950 10711023 http://scholarbank.nus.edu.sg/handle/10635/82236 000243324400034 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1116/1.2382950
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Hwang, W.S.
Cho, B.-J.
Chan, D.S.H.
Bliznetsov, V.
Yoo, W.J.
format Article
author Hwang, W.S.
Cho, B.-J.
Chan, D.S.H.
Bliznetsov, V.
Yoo, W.J.
spellingShingle Hwang, W.S.
Cho, B.-J.
Chan, D.S.H.
Bliznetsov, V.
Yoo, W.J.
Effects of SiO2/Si3N4 hard masks on etching properties of metal gates
author_sort Hwang, W.S.
title Effects of SiO2/Si3N4 hard masks on etching properties of metal gates
title_short Effects of SiO2/Si3N4 hard masks on etching properties of metal gates
title_full Effects of SiO2/Si3N4 hard masks on etching properties of metal gates
title_fullStr Effects of SiO2/Si3N4 hard masks on etching properties of metal gates
title_full_unstemmed Effects of SiO2/Si3N4 hard masks on etching properties of metal gates
title_sort effects of sio2/si3n4 hard masks on etching properties of metal gates
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/82236
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