Excellent c-Si surface passivation by thermal atomic layer deposited aluminum oxide after industrial firing activation

10.1088/0022-3727/46/38/385102

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Bibliographic Details
Main Authors: Liao, B., Stangl, R., Ma, F., Mueller, T., Lin, F., Aberle, A.G., Bhatia, C.S., Hoex, B.
Other Authors: SOLAR ENERGY RESEARCH INST OF S'PORE
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/82311
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-823112023-10-30T23:05:48Z Excellent c-Si surface passivation by thermal atomic layer deposited aluminum oxide after industrial firing activation Liao, B. Stangl, R. Ma, F. Mueller, T. Lin, F. Aberle, A.G. Bhatia, C.S. Hoex, B. SOLAR ENERGY RESEARCH INST OF S'PORE ELECTRICAL & COMPUTER ENGINEERING 10.1088/0022-3727/46/38/385102 Journal of Physics D: Applied Physics 46 38 - JPAPB 2014-10-07T04:27:53Z 2014-10-07T04:27:53Z 2013-09-25 Article Liao, B., Stangl, R., Ma, F., Mueller, T., Lin, F., Aberle, A.G., Bhatia, C.S., Hoex, B. (2013-09-25). Excellent c-Si surface passivation by thermal atomic layer deposited aluminum oxide after industrial firing activation. Journal of Physics D: Applied Physics 46 (38) : -. ScholarBank@NUS Repository. https://doi.org/10.1088/0022-3727/46/38/385102 00223727 http://scholarbank.nus.edu.sg/handle/10635/82311 000324099000007 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1088/0022-3727/46/38/385102
author2 SOLAR ENERGY RESEARCH INST OF S'PORE
author_facet SOLAR ENERGY RESEARCH INST OF S'PORE
Liao, B.
Stangl, R.
Ma, F.
Mueller, T.
Lin, F.
Aberle, A.G.
Bhatia, C.S.
Hoex, B.
format Article
author Liao, B.
Stangl, R.
Ma, F.
Mueller, T.
Lin, F.
Aberle, A.G.
Bhatia, C.S.
Hoex, B.
spellingShingle Liao, B.
Stangl, R.
Ma, F.
Mueller, T.
Lin, F.
Aberle, A.G.
Bhatia, C.S.
Hoex, B.
Excellent c-Si surface passivation by thermal atomic layer deposited aluminum oxide after industrial firing activation
author_sort Liao, B.
title Excellent c-Si surface passivation by thermal atomic layer deposited aluminum oxide after industrial firing activation
title_short Excellent c-Si surface passivation by thermal atomic layer deposited aluminum oxide after industrial firing activation
title_full Excellent c-Si surface passivation by thermal atomic layer deposited aluminum oxide after industrial firing activation
title_fullStr Excellent c-Si surface passivation by thermal atomic layer deposited aluminum oxide after industrial firing activation
title_full_unstemmed Excellent c-Si surface passivation by thermal atomic layer deposited aluminum oxide after industrial firing activation
title_sort excellent c-si surface passivation by thermal atomic layer deposited aluminum oxide after industrial firing activation
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/82311
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