Excellent c-Si surface passivation by thermal atomic layer deposited aluminum oxide after industrial firing activation

10.1088/0022-3727/46/38/385102

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Bibliographic Details
Main Authors:	Liao, B., Stangl, R., Ma, F., Mueller, T., Lin, F., Aberle, A.G., Bhatia, C.S., Hoex, B.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/82311
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Institution:	National University of Singapore

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spelling	sg-nus-scholar.10635-823112024-11-12T21:34:53Z Excellent c-Si surface passivation by thermal atomic layer deposited aluminum oxide after industrial firing activation Liao, B. Stangl, R. Ma, F. Mueller, T. Lin, F. Aberle, A.G. Bhatia, C.S. Hoex, B. ELECTRICAL & COMPUTER ENGINEERING SOLAR ENERGY RESEARCH INST OF S'PORE 10.1088/0022-3727/46/38/385102 Journal of Physics D: Applied Physics 46 38 - JPAPB 2014-10-07T04:27:53Z 2014-10-07T04:27:53Z 2013-09-25 Article Liao, B., Stangl, R., Ma, F., Mueller, T., Lin, F., Aberle, A.G., Bhatia, C.S., Hoex, B. (2013-09-25). Excellent c-Si surface passivation by thermal atomic layer deposited aluminum oxide after industrial firing activation. Journal of Physics D: Applied Physics 46 (38) : -. ScholarBank@NUS Repository. https://doi.org/10.1088/0022-3727/46/38/385102 00223727 http://scholarbank.nus.edu.sg/handle/10635/82311 000324099000007 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1088/0022-3727/46/38/385102
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Liao, B. Stangl, R. Ma, F. Mueller, T. Lin, F. Aberle, A.G. Bhatia, C.S. Hoex, B.
format	Article
author	Liao, B. Stangl, R. Ma, F. Mueller, T. Lin, F. Aberle, A.G. Bhatia, C.S. Hoex, B.
spellingShingle	Liao, B. Stangl, R. Ma, F. Mueller, T. Lin, F. Aberle, A.G. Bhatia, C.S. Hoex, B. Excellent c-Si surface passivation by thermal atomic layer deposited aluminum oxide after industrial firing activation
author_sort	Liao, B.
title	Excellent c-Si surface passivation by thermal atomic layer deposited aluminum oxide after industrial firing activation
title_short	Excellent c-Si surface passivation by thermal atomic layer deposited aluminum oxide after industrial firing activation
title_full	Excellent c-Si surface passivation by thermal atomic layer deposited aluminum oxide after industrial firing activation
title_fullStr	Excellent c-Si surface passivation by thermal atomic layer deposited aluminum oxide after industrial firing activation
title_full_unstemmed	Excellent c-Si surface passivation by thermal atomic layer deposited aluminum oxide after industrial firing activation
title_sort	excellent c-si surface passivation by thermal atomic layer deposited aluminum oxide after industrial firing activation
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/82311
_version_	1821194601698951168

Excellent c-Si surface passivation by thermal atomic layer deposited aluminum oxide after industrial firing activation

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