Excellent passivation of p + silicon surfaces by inline plasma enhanced chemical vapor deposited SiO x/AlO x stacks

Excellent passivation of p + silicon surfaces by inline plasma enhanced chemical vapor deposited SiO x/AlO x stacks

10.1143/JJAP.51.10NA17

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Bibliographic Details
Main Authors: Lin, F., Duttagupta, S., Shetty, K.D., Boreland, M., Aberle, A.G., Hoex, B.
Other Authors: SOLAR ENERGY RESEARCH INST OF S'PORE
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/82312
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/82312

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