Excellent passivation of p + silicon surfaces by inline plasma enhanced chemical vapor deposited SiO x/AlO x stacks

10.1143/JJAP.51.10NA17

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Bibliographic Details
Main Authors:	Lin, F., Duttagupta, S., Shetty, K.D., Boreland, M., Aberle, A.G., Hoex, B.
Other Authors:	SOLAR ENERGY RESEARCH INST OF S'PORE
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/82312
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-82312
record_format	dspace
spelling	sg-nus-scholar.10635-823122023-10-30T23:05:47Z Excellent passivation of p + silicon surfaces by inline plasma enhanced chemical vapor deposited SiO x/AlO x stacks Lin, F. Duttagupta, S. Shetty, K.D. Boreland, M. Aberle, A.G. Hoex, B. SOLAR ENERGY RESEARCH INST OF S'PORE ELECTRICAL & COMPUTER ENGINEERING 10.1143/JJAP.51.10NA17 Japanese Journal of Applied Physics 51 10 PART 2 - 2014-10-07T04:27:53Z 2014-10-07T04:27:53Z 2012-10 Article Lin, F., Duttagupta, S., Shetty, K.D., Boreland, M., Aberle, A.G., Hoex, B. (2012-10). Excellent passivation of p + silicon surfaces by inline plasma enhanced chemical vapor deposited SiO x/AlO x stacks. Japanese Journal of Applied Physics 51 (10 PART 2) : -. ScholarBank@NUS Repository. https://doi.org/10.1143/JJAP.51.10NA17 00214922 http://scholarbank.nus.edu.sg/handle/10635/82312 000310707800017 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1143/JJAP.51.10NA17
author2	SOLAR ENERGY RESEARCH INST OF S'PORE
author_facet	SOLAR ENERGY RESEARCH INST OF S'PORE Lin, F. Duttagupta, S. Shetty, K.D. Boreland, M. Aberle, A.G. Hoex, B.
format	Article
author	Lin, F. Duttagupta, S. Shetty, K.D. Boreland, M. Aberle, A.G. Hoex, B.
spellingShingle	Lin, F. Duttagupta, S. Shetty, K.D. Boreland, M. Aberle, A.G. Hoex, B. Excellent passivation of p + silicon surfaces by inline plasma enhanced chemical vapor deposited SiO x/AlO x stacks
author_sort	Lin, F.
title	Excellent passivation of p + silicon surfaces by inline plasma enhanced chemical vapor deposited SiO x/AlO x stacks
title_short	Excellent passivation of p + silicon surfaces by inline plasma enhanced chemical vapor deposited SiO x/AlO x stacks
title_full	Excellent passivation of p + silicon surfaces by inline plasma enhanced chemical vapor deposited SiO x/AlO x stacks
title_fullStr	Excellent passivation of p + silicon surfaces by inline plasma enhanced chemical vapor deposited SiO x/AlO x stacks
title_full_unstemmed	Excellent passivation of p + silicon surfaces by inline plasma enhanced chemical vapor deposited SiO x/AlO x stacks
title_sort	excellent passivation of p + silicon surfaces by inline plasma enhanced chemical vapor deposited sio x/alo x stacks
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/82312
_version_	1781784106362732544

Excellent passivation of p + silicon surfaces by inline plasma enhanced chemical vapor deposited SiO x/AlO x stacks

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