Fermi-level pinning at the interface between metals and nitrogen-doped Ge2 Sb2 Te5 examined by x-ray photoelectron spectroscopy

10.1063/1.3263953

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Bibliographic Details
Main Authors: Fang, L.W.-W., Zhao, R., Pan, J., Zhang, Z., Shi, L., Chong, T.-C., Yeo, Y.-C.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/82354
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Institution: National University of Singapore
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