Fully silicided NiSi:Hf-LaAlO3/SG-GOI n-MOSFETs with high electron mobility

10.1109/LED.2004.832527

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Bibliographic Details
Main Authors: Yu, D.S., Chiang, K.C., Cheng, C.F., Chin, A., Zhu, C., Li, M.F., Kwong, D.-L.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/82392
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-823922023-10-29T22:38:38Z Fully silicided NiSi:Hf-LaAlO3/SG-GOI n-MOSFETs with high electron mobility Yu, D.S. Chiang, K.C. Cheng, C.F. Chin, A. Zhu, C. Li, M.F. Kwong, D.-L. ELECTRICAL & COMPUTER ENGINEERING 10.1109/LED.2004.832527 IEEE Electron Device Letters 25 8 559-561 EDLED 2014-10-07T04:28:50Z 2014-10-07T04:28:50Z 2004-08 Article Yu, D.S., Chiang, K.C., Cheng, C.F., Chin, A., Zhu, C., Li, M.F., Kwong, D.-L. (2004-08). Fully silicided NiSi:Hf-LaAlO3/SG-GOI n-MOSFETs with high electron mobility. IEEE Electron Device Letters 25 (8) : 559-561. ScholarBank@NUS Repository. https://doi.org/10.1109/LED.2004.832527 07413106 http://scholarbank.nus.edu.sg/handle/10635/82392 000222905100015 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1109/LED.2004.832527
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Yu, D.S.
Chiang, K.C.
Cheng, C.F.
Chin, A.
Zhu, C.
Li, M.F.
Kwong, D.-L.
format Article
author Yu, D.S.
Chiang, K.C.
Cheng, C.F.
Chin, A.
Zhu, C.
Li, M.F.
Kwong, D.-L.
spellingShingle Yu, D.S.
Chiang, K.C.
Cheng, C.F.
Chin, A.
Zhu, C.
Li, M.F.
Kwong, D.-L.
Fully silicided NiSi:Hf-LaAlO3/SG-GOI n-MOSFETs with high electron mobility
author_sort Yu, D.S.
title Fully silicided NiSi:Hf-LaAlO3/SG-GOI n-MOSFETs with high electron mobility
title_short Fully silicided NiSi:Hf-LaAlO3/SG-GOI n-MOSFETs with high electron mobility
title_full Fully silicided NiSi:Hf-LaAlO3/SG-GOI n-MOSFETs with high electron mobility
title_fullStr Fully silicided NiSi:Hf-LaAlO3/SG-GOI n-MOSFETs with high electron mobility
title_full_unstemmed Fully silicided NiSi:Hf-LaAlO3/SG-GOI n-MOSFETs with high electron mobility
title_sort fully silicided nisi:hf-laalo3/sg-goi n-mosfets with high electron mobility
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/82392
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