Germanium incorporation in Hf O2 dielectric on germanium substrate

10.1149/1.2160432

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Bibliographic Details
Main Authors: Zhang, Q., Wu, N., Lai, D.M.Y., Nikolai, Y., Bera, L.K., Zhu, C.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/82410
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Institution: National University of Singapore
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