High germanium content strained SGOI by oxidation of amorphous SiGe film on SOI substrates

10.1149/1.2087167

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Bibliographic Details
Main Authors:	Gao, F., Balakumar, S., Balasubramanian, N., Lee, S.J., Tung, C.H., Kumar, R., Sudhiranjan, T., Foo, Y.L., Kwong, D.-L.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/82449
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-82449
record_format	dspace
spelling	sg-nus-scholar.10635-824492024-11-10T21:13:24Z High germanium content strained SGOI by oxidation of amorphous SiGe film on SOI substrates Gao, F. Balakumar, S. Balasubramanian, N. Lee, S.J. Tung, C.H. Kumar, R. Sudhiranjan, T. Foo, Y.L. Kwong, D.-L. ELECTRICAL & COMPUTER ENGINEERING 10.1149/1.2087167 Electrochemical and Solid-State Letters 8 12 G337-G340 ESLEF 2014-10-07T04:29:31Z 2014-10-07T04:29:31Z 2005 Article Gao, F., Balakumar, S., Balasubramanian, N., Lee, S.J., Tung, C.H., Kumar, R., Sudhiranjan, T., Foo, Y.L., Kwong, D.-L. (2005). High germanium content strained SGOI by oxidation of amorphous SiGe film on SOI substrates. Electrochemical and Solid-State Letters 8 (12) : G337-G340. ScholarBank@NUS Repository. https://doi.org/10.1149/1.2087167 10990062 http://scholarbank.nus.edu.sg/handle/10635/82449 000232697800021 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1149/1.2087167
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Gao, F. Balakumar, S. Balasubramanian, N. Lee, S.J. Tung, C.H. Kumar, R. Sudhiranjan, T. Foo, Y.L. Kwong, D.-L.
format	Article
author	Gao, F. Balakumar, S. Balasubramanian, N. Lee, S.J. Tung, C.H. Kumar, R. Sudhiranjan, T. Foo, Y.L. Kwong, D.-L.
spellingShingle	Gao, F. Balakumar, S. Balasubramanian, N. Lee, S.J. Tung, C.H. Kumar, R. Sudhiranjan, T. Foo, Y.L. Kwong, D.-L. High germanium content strained SGOI by oxidation of amorphous SiGe film on SOI substrates
author_sort	Gao, F.
title	High germanium content strained SGOI by oxidation of amorphous SiGe film on SOI substrates
title_short	High germanium content strained SGOI by oxidation of amorphous SiGe film on SOI substrates
title_full	High germanium content strained SGOI by oxidation of amorphous SiGe film on SOI substrates
title_fullStr	High germanium content strained SGOI by oxidation of amorphous SiGe film on SOI substrates
title_full_unstemmed	High germanium content strained SGOI by oxidation of amorphous SiGe film on SOI substrates
title_sort	high germanium content strained sgoi by oxidation of amorphous sige film on soi substrates
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/82449
_version_	1821191550809407488

High germanium content strained SGOI by oxidation of amorphous SiGe film on SOI substrates

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