Improvement of Electrical Properties of MOCVD HfO2 by Multistep Deposition
10.1149/1.1618071
Saved in:
| Main Authors: | , , , , , , , |
|---|---|
| Other Authors: | |
| Format: | Article |
| Published: |
2014
|
| Online Access: | http://scholarbank.nus.edu.sg/handle/10635/82508 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| Institution: | National University of Singapore |
| id |
sg-nus-scholar.10635-82508 |
|---|---|
| record_format |
dspace |
| spelling |
sg-nus-scholar.10635-825082023-10-29T22:12:08Z Improvement of Electrical Properties of MOCVD HfO2 by Multistep Deposition Yeo, C.C. Cho, B.J. Joo, M.S. Whoang, S.J. Kwong, D.L. Bera, L.K. Mathew, S. Balasubramanian, N. ELECTRICAL & COMPUTER ENGINEERING 10.1149/1.1618071 Electrochemical and Solid-State Letters 6 11 F42-F44 ESLEF 2014-10-07T04:30:13Z 2014-10-07T04:30:13Z 2003-11 Article Yeo, C.C., Cho, B.J., Joo, M.S., Whoang, S.J., Kwong, D.L., Bera, L.K., Mathew, S., Balasubramanian, N. (2003-11). Improvement of Electrical Properties of MOCVD HfO2 by Multistep Deposition. Electrochemical and Solid-State Letters 6 (11) : F42-F44. ScholarBank@NUS Repository. https://doi.org/10.1149/1.1618071 10990062 http://scholarbank.nus.edu.sg/handle/10635/82508 000185705200016 Scopus |
| institution |
National University of Singapore |
| building |
NUS Library |
| continent |
Asia |
| country |
Singapore Singapore |
| content_provider |
NUS Library |
| collection |
ScholarBank@NUS |
| description |
10.1149/1.1618071 |
| author2 |
ELECTRICAL & COMPUTER ENGINEERING |
| author_facet |
ELECTRICAL & COMPUTER ENGINEERING Yeo, C.C. Cho, B.J. Joo, M.S. Whoang, S.J. Kwong, D.L. Bera, L.K. Mathew, S. Balasubramanian, N. |
| format |
Article |
| author |
Yeo, C.C. Cho, B.J. Joo, M.S. Whoang, S.J. Kwong, D.L. Bera, L.K. Mathew, S. Balasubramanian, N. |
| spellingShingle |
Yeo, C.C. Cho, B.J. Joo, M.S. Whoang, S.J. Kwong, D.L. Bera, L.K. Mathew, S. Balasubramanian, N. Improvement of Electrical Properties of MOCVD HfO2 by Multistep Deposition |
| author_sort |
Yeo, C.C. |
| title |
Improvement of Electrical Properties of MOCVD HfO2 by Multistep Deposition |
| title_short |
Improvement of Electrical Properties of MOCVD HfO2 by Multistep Deposition |
| title_full |
Improvement of Electrical Properties of MOCVD HfO2 by Multistep Deposition |
| title_fullStr |
Improvement of Electrical Properties of MOCVD HfO2 by Multistep Deposition |
| title_full_unstemmed |
Improvement of Electrical Properties of MOCVD HfO2 by Multistep Deposition |
| title_sort |
improvement of electrical properties of mocvd hfo2 by multistep deposition |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/82508 |
| _version_ |
1781784158675140608 |