Improvement of Electrical Properties of MOCVD HfO2 by Multistep Deposition

• Main Authors: Yeo, C.C., Cho, B.J., Joo, M.S., Whoang, S.J., Kwong, D.L., Bera, L.K., Mathew, S., Balasubramanian, N.
• 其他作者: ELECTRICAL & COMPUTER ENGINEERING
• 格式: Article
• 出版: 2014
• 在線閱讀: http://scholarbank.nus.edu.sg/handle/10635/82508
• 機構: National University of Singapore

10.1149/1.1618071