Improvement of voltage linearity in high-κ MIM capacitors using HfO2-SiO2 stacked dielectric

10.1109/LED.2004.832785

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Bibliographic Details
Main Authors:	Kim, S.J., Cho, B.J., Li, M.-F., Ding, S.-J., Zhu, C., Yu, M.B., Narayanan, B., Chin, A., Kwong, D.-L.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/82510
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-82510
record_format	dspace
spelling	sg-nus-scholar.10635-825102024-11-14T01:24:55Z Improvement of voltage linearity in high-κ MIM capacitors using HfO2-SiO2 stacked dielectric Kim, S.J. Cho, B.J. Li, M.-F. Ding, S.-J. Zhu, C. Yu, M.B. Narayanan, B. Chin, A. Kwong, D.-L. ELECTRICAL & COMPUTER ENGINEERING 10.1109/LED.2004.832785 IEEE Electron Device Letters 25 8 538-540 EDLED 2014-10-07T04:30:14Z 2014-10-07T04:30:14Z 2004-08 Article Kim, S.J., Cho, B.J., Li, M.-F., Ding, S.-J., Zhu, C., Yu, M.B., Narayanan, B., Chin, A., Kwong, D.-L. (2004-08). Improvement of voltage linearity in high-κ MIM capacitors using HfO2-SiO2 stacked dielectric. IEEE Electron Device Letters 25 (8) : 538-540. ScholarBank@NUS Repository. https://doi.org/10.1109/LED.2004.832785 07413106 http://scholarbank.nus.edu.sg/handle/10635/82510 000222905100008 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1109/LED.2004.832785
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Kim, S.J. Cho, B.J. Li, M.-F. Ding, S.-J. Zhu, C. Yu, M.B. Narayanan, B. Chin, A. Kwong, D.-L.
format	Article
author	Kim, S.J. Cho, B.J. Li, M.-F. Ding, S.-J. Zhu, C. Yu, M.B. Narayanan, B. Chin, A. Kwong, D.-L.
spellingShingle	Kim, S.J. Cho, B.J. Li, M.-F. Ding, S.-J. Zhu, C. Yu, M.B. Narayanan, B. Chin, A. Kwong, D.-L. Improvement of voltage linearity in high-κ MIM capacitors using HfO2-SiO2 stacked dielectric
author_sort	Kim, S.J.
title	Improvement of voltage linearity in high-κ MIM capacitors using HfO2-SiO2 stacked dielectric
title_short	Improvement of voltage linearity in high-κ MIM capacitors using HfO2-SiO2 stacked dielectric
title_full	Improvement of voltage linearity in high-κ MIM capacitors using HfO2-SiO2 stacked dielectric
title_fullStr	Improvement of voltage linearity in high-κ MIM capacitors using HfO2-SiO2 stacked dielectric
title_full_unstemmed	Improvement of voltage linearity in high-κ MIM capacitors using HfO2-SiO2 stacked dielectric
title_sort	improvement of voltage linearity in high-κ mim capacitors using hfo2-sio2 stacked dielectric
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/82510
_version_	1821202996044759040

Improvement of voltage linearity in high-κ MIM capacitors using HfO2-SiO2 stacked dielectric

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